SSA800 採用的 self-aligned quadruple patterning（自對準四重曝光）技術，讓中國在不依賴 ASML EUV 機台的情況下，仍能以 DUV 設備製造較先進製程的晶片。雖然這種多重曝光方式在良率和成本上不如 ...
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