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PPT - GaAs MESFET Process Flow PowerPoint Presentation, free download - ID:2953656
GaAs MESFET Process Flow. Wafer Cleaning Device Processing. Wafer Cleaning. Degreasing (grease) Boil the substrate in Trichloroethane (TCE – 80 C) for 10 minutes (hard grease) Soak in warm Acetone (50 C) for 10 minutes (light grease and polymers) Soak in IPA (2-propanol) for 10 minutes
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